Page 26 - Synthesis of Functional Nanoparticles Using an Atmospheric Pressure Microplasma Process - LiangLiang Lin
P. 26

Chapter 1
Table 1.2 A Microplasma
configuration Hollow-electrode microdischarges
Microplasma jets with external electrodes
Microplasma jets with consumable electrodes
Plasma-liquid systems
summary of microplasma systems used for nanomaterial synthesis
Power sources*
CCP./15–35 kHz DC/1-20 mA, 500-700 V DC/0-10 kV
DC/38 kW (700 A/55 V) ICP./CCP.450 MHz ICP./CCP.144 MHz CCP./13.56 MHz, 450 MHz CCP./13.56 MHz, 430 MHz ICP./CCP.450 MHz CCP./450 MHz
CCP./14 MHz
ICP./0-10 kV CCP./2.45 GHz CCP./15 kHz, 30 kHz CCP./13.56 MHz
Generated products** Ref.
               Fe Al2O3 NPs
Fe/Ni NPs
Si NPs
CNTs, C NSs
TiO2 NPs, TiC/TiN NSFs C-NPs, CNTs Fe/Cu/Au/Mo NPs MoO3/ WOx NPs
Ni NPs, CNTs Ag/Au/Ni/Ti/Ir/ CuOx/Fe3O4 NPs, Si NCs Zn/ZnO NPs
Ag/Au NPs, Tin, Fe C NS
87
88
71,78, 89–96
97
98,99
100 101,102 103–105 106 80,107–111 112
85,89 113–122
52 47,123–125 126
     * CCP. = capacitive coupling plasma; ICP. = inductive coupling plasma; DC=DC plasma
** NP = nanoparticles; NS = nanostructures; CNTs = carbon nanotubes; NSF = nanostructured films
1.3.3 Typical Applications of Nanoparticles
Since nanomaterials exhibit properties that are highly attractive to a number of high- performance applications, they are reported to be used in various fields, as shown in Figure 1.7. Currently the nanomaterial fabrication is considered as one of the most promising and rapidly developing research fields. Due to the unique characteristics such as the non- equilibrium state, stable operation at atmospheric pressure and room temperature, high radical densities, microplasma is particularly suitable for nanomaterial fabrication. In this section the applications of some typical nanomaterials are briefly reviewed.
14
CNTs
CuO/PdO/NiO NSs
 Si NCs, Ni/Fe/Cu/Pt NPs,
 Nix
1−x, Nix
FeyCu1−x-y NPs
     



























































   24   25   26   27   28